Tabletop 2L 13.56 MHz Plasma Cleaner / Plasma Cleaning System for Wafer Cleaning/ Compact High-Performance Plasma Cleaning
We, Yatherm Scientific, proudly announce our exceptional product the Tabletop 2L 13.56 MHz Plasma Cleaner, It is an extremely powerful solution for wafer cleansing and surface activation, which also solves your space related issues because it’s designed in a compact size which can fit anywhere.
The labs and small-scale productions pick this as their first choice. This wonderful mechanism is a perfect blend of plasma cleaning system and advanced vacuum plasma cleaning with atmospheric plasma treatment technology, which makes sure that you always have super clean surfaces with the increase in adhesion and wettability.
2L Chamber with 13.56 MHz RF Plasma
Because it has a built-in, 2-liter plasma chamber, this mechanism is extremely helpful in supporting a range of wafer sizes and delicate substrates.
As it is working at industry-standard 13.56 MHz radio frequency, it is able to generate consistent, uniform plasma that perfectly takes out particles, glue, and other organic remains so perfectly that even at the nanoscale you won’t find any residue.
The integration of atmospheric plasma capability helps in further improvements of surface energy and enhances the receptibility of wafers towards coatings, bonding, and lithography.
Safe and Damage-Free Cleaning
This equipment works wonderfully when it comes to making the surfaces absolutely contamination-free before you want to conduct any tasks like deposition, lithography or boarding. Its special design for semiconductor wafer preparation comes in handy for all lab owners who want to do those tasks mentioned above.
As it is equipped with ultra-low temperature plasma options (<50°C), it is capable of treating extremely heat-sensitive wafers and microelectronic parts with utmost care and causes no damage whatsoever. You will be able to experience real-time monitoring of air pressure, voltage, and system temperature, which gives you an absolute guarantee of constant functionality, while the automated failure alarm system always warns you in case of any
emergency.
Key Features (Tabletop Plasma Cleaner)
● Tabletop 2L Plasma Chamber which is specifically useful in the versatile lab applications.
● 13.56 MHz RF Plasma Source gives you the best, consistent and uniformly cleaned surfaces throughout
● Equipped with Vacuum + Atmospheric Plasma, which helps in perfect cleansing and surface activation.
● Experience totally Damage-Free Processing because of its ultra-low temperature options.
● Comes with a wide enough, luminous screen which helps in intelligent Monitoring of pressure, voltage, and system health.
● Built in compact design and which is easy-to-use for research and production laboratories.
Applications
● Semiconductor Wafer Cleaning: This technology is extremely helpful in the preparation for lithography, bonding, and thin-film coating.
● Consumer Electronics & PCB/FPC Manufacturing: It helps wonderfully in the removal of organic remains and surface activation before you began any task like printing, soldering, or coating.
● FPD Display & Glass Industry: It works really well when it comes to cleaning surfaces before bonding and laminating in this particular field.
● Automotive & Connector Industry: The useful of this machine in improving adhesion in bonding and assembly processes is absolutely unmatched.
● Battery and New Energy Industry: It is the best when it you need to clean electrode and casing surface for trustable assembly.
Why Yatherm Scientific is the Best Pick for Your Business Growth?
Our Tabletop 2L 13.56 MHz Plasma Cleaner provides highly advanced plasma technology, which is loaded in a compact, trustable and lab-ready mechanism. By making a perfect integrated system of accurate wafer cleaning with broad atmospheric plasma applications, we make sure that you experience damage -free surfaces, high level bonding strength, and increased precision for semiconductor, electronics, and industrial manufacturing.
Specification of the Tabletop 2L 13.56MHZ plasma cleaner / plasma cleaning system for wafer cleaning
| Model | YS-2S |
| Input Power | AC 220V, 50/60 Hz |
| RF Power | 0-100W/0-300W (also can be designed according to your need) |
| RF frequency | 13,56 MHz (40KHZ is also available) |
| Frequency offset | Less than 0.2KHz |
| Control Panel | Control Function: Clean time, RF Power, Vacuum Pump |
| Process Control | MCU Automatic and manual mode |
| Plasma Chamber | Φ100mm×270mm stainless steel chamber
2 Liter Capacity |
| Characteristic impedance | 50 Ohm,Automatic matching |
| Vacuum degree | 10Pa -1000Pa |
| Cleaning time | 1 to 100 minutes ( adjustable) |
| Flow rate | 60—600ml/min(adjustable) |
| Inert Gas | Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air, and Mixed gas depended on what kind material will be treated. ( not included in the package) |
| Optional | Combinations of plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. |
| Vacuum chamber temperature | Less than 65°C |
| Cooling type: | Forced cooling |
| Dimensions | 400x450x250 |
| Net Weight | 36.5kg |
| Warranty | One year limited warranty with lifetime support |
What We Offer
