Laboratory Wafer Production Vacuum Plasma Cleaning Machine / Lithography Machine / Developing and Cleaning Machine
Hitech Wafer Cleaning and Lithography System
Yatherm Scientific, proudly announcing the exceptional product, the Laboratory Wafer Production Vacuum Plasma Cleaning Machine, it's a perfect combo of all-in-one solution , it is manufactured by including three advanced technologies, i.e. vacuum plasma cleaning, lithography, and developing/cleaning functions.
It is engineered with utmost precision for things like semiconductor fabrication and microelectronics research, this mechanism will provide a totally contaminant-free wafer preparation along with the included flexibility of lithography patterning and photoresist development.
Vacuum and Atmospheric Plasma Cleaning Technology
The mechanism is the integration of vacuum plasma cleaning for Nano scale removal of the particles present, removal of the glue and organic films, while also at the same time giving support to the atmospheric plasma treatment for surface activation.
Using high-voltage ionization of gases such as air or oxygen, With the use of high-voltage ionization of gases like oxygen or air itself, atmospheric plasma make the increase in factors like energy, wettability and adhesion, making the wafers and substrates way better in receptivity when to comes to coatings, bonding and lithography. Because of this dual capability, you can ensure that you will experience maximum versatile performance in your laboratory and
production space.
Lithography and Developing Integration
Along with the process of cleaning, the system also works wonderfully as a lithography platform, which help in enabling a coating which is absolutely precise, exposure to the right pattern and alignment. In the developing and cleaning stage, removal of the residual resist happens, and then the process of generating sharp micro patterns is done which is essential for semiconductor device fabrication.
This approach of integrated system decreases handling, enhance effectiveness and makes sure that the task is done without any contamination.
Main Features:
● The exceptional technology of vacuum and atmospheric plasma cleaning can be used in various fields.
● The surface activation done by this equipment helps in the improvement of bonding, coating and quality of printing.
● It’s a system which is built by integrating lithography & developing in one platform only.
● Get real-time monitoring of characteristics like voltage, temperature and pressure.
● It comes with a built in alarm system, which warns you about the failure alerts for gas pressure, overload, and any other system errors which might happen during a task.
● We made it in compact laboratory design which is perfectly suitable for both Research & Development work and also wafer fibs.)
Applications
● Semiconductor Wafer Fabrication: It is used for cleaning, lithography and developing, and all this can be achieved wonderfully.
● FPD Display & Glass Industry: It works flawlessly when it comes to removing organic remains before the bonding process.
● 6C Electronics & PCB/FPC Manufacturing: Through this wonderful equipment it’s easier to do plasma activation before coating, welding, or dispensing.
● Automotive & Battery Industry: The extremely important task like surface preparation for bonding, welding, and encapsulation in this field was never that easy before.
Why You Must Choose Only Yatherm?
Yatherm’s Vacuum Plasma Cleaning and Lithography Machine combined the two revolutionary systems in one i. e. plasma cleaning technology with integrated lithography and development systems, and this gives you a phenomenal instrument.
No matter where it is used, whether in semiconductor wafer production, microelectronics research and development, or processing of advanced materials etc., it will provide you a guarantee of super clean surfaces, accuracy in pattern making, and enhanced adhesion, which provides great help for industries in achieving higher yields and fault free performance consistently.
So call us now, and book a free consultation. We will help you in selecting the best one for you, and let’s work together and reach great heights in the business world of your field.
Key attributes
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warranty
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1 Year
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weight (kg)
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45
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power(w)
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0-500W
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dimension(l*w*h)
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650*550*440mm (W*H*D)
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Product name
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Plasma Cleaning Machine
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Key word
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Atmospheric plasma
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brand name
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Minder-Pack
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General technical parameters of the equipment
*Cavity material： Stainless steel surface treatment
*Power supply： AC220V
*Working current： The working current of the whole machine is not more than 1.2A (excluding vacuum pump)
*RF power supply： 0-300W Adjustable
*RF frequency： 40KHZ
*Frequency offset： ＜ 0.2KHz
*Characteristic impedance： 50 ohm, automatic matching
*Vacuum degree： 1pa-30Pa
*Number of gas paths： Dual gas input
*Gas flow： 10—100ml/min(Adjustable)
*Process control： PLC operation interface automatic and manual mode
Cleaning time： 1-6000s(Adjustable)
Power size: 10%-100%(Adjustable)
Inner cavity size: L×W:150*270mm
*Dimension： _510x450x420 mm
*Weight： 45Kg
*Vacuum pump： 2XZ-4
*Vacuum chamber temperature： ＜ 65°C
*Cooling method： Forced air cooling